Aluminium Nitride Sputtering Target
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Get Price2015-7-20 · Piezoelectric aluminum nitride thin films were deposited on aluminum- (AlMo) metallic nanocomposites using reactive DC sputtering at room temperature. The effect of sputtering parameters on film properties was assessed. A comparative study between AlN grown on AlMo and pure aluminum showed an equivalent (002) crystallographic texture.
Get Price2019-2-1 · 1. Introduction. Aluminum nitride (AlN) thin films have many applications in microelectronic and optoelectronic devices [].AlN thin films with (002) texture [], low surface roughness [] and residual stress [] are desirable for these applications.In order to improve these features of the deposited thin films, high power pulsed magnetron sputtering (HPPMS) have .
Get Price2021-12-16 · Sputtering targets manufacturer and supplier in China! High purity sputtering target materials for sale. Wholesale and buy pure metal targets, alloy targets and ceramic targets for thin film, semiconductor. Including planar sputtering targets, rectangular sputtering targets, rotary (rotatable) sputtering targets etc.
Get PriceAluminum Nitride Sputtering Target: Aluminum nitride sputtering target: 24304-00-5: 246-140-8: European Inventory of Existing Commercial Chemical Substances (EINECS) Listed. EC Inventory: Listed. United States Toxic Substances Control Act (TSCA) Inventory: Listed. China Catalog of Hazardous chemicals 2015: Not Listed. New Zealand Inventory of ...
Get Price2018-6-2 · A sputtering power in the range of 300 W to 500 W is typically used in RF sputtering, while a power in the range of 1000 W to 1800 W is typically employed in D.C. sputtering. The sputtering power also depends on the substrate to target distance and the type of sputtering system. For the former, a lower power is needed for a shorter distance.
Get PriceAluminum Nitride Sputtering Targets Specifications. Purity: 99.8% or International standards type Shape: Discs, Plate,Step (Dia 3 50mm, Thickness 1mm) Rectangle, Sheet, Step (Length 350mm, Width 200mm, Thickness 1mm)Custom shapes .
Get Price2020-10-13 · Aluminum Nitride Thin Films. by. Reactive Sputtering by Alvin G. Randolph, III. I, Alvin G. Randolph, hereby grant permission to the Wallace Memorial Library ofthe
Get Price2018-4-24 · We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications. The information is collated from the analysis of around 80 journal articles that sputtered this film on variety of substrate materials, processes and equipment. This review will be a good starting point to .
Get PriceAluminum Nitride Sputtering Target: Aluminum nitride sputtering target: 24304-00-5: 246-140-8: European Inventory of Existing Commercial Chemical Substances (EINECS) Listed. EC Inventory: Listed. United States Toxic Substances Control Act (TSCA) Inventory: Listed. China Catalog of Hazardous chemicals 2015: Not Listed. New Zealand Inventory of ...
Get PriceAluminum Nitride (AlN) Sputtering Targets Overview Our comprehensive offering of sputtering targets, evaporation sources and other deposition materials is listed by material throughout the website. Below you will find budgetary pricing for sputtering targets and deposition materials per your requirements.
Get Price2018-1-9 · Aluminum Nitride Preference. Aluminum nitride devices have high hardness, high modulus, very high dielectric properties, good oxidationresistant property and low-thermal expansion efficient, which is approximate to that of Silicon. When the AlN powers is used to make composites its interface compatibleness is good .
Get Price2019-12-5 · We perform pulsed DC sputtering of aluminium nitride (002) thin films on top of cubic silicon carbide-on-silicon (100) substrates at different substrate temperatures and deposition powers. The films are characterized using the following parameters: FWHM of diffraction peak, FWHM of the rocking curve, residual stress, thickness, deposition rate, grain size, and surface .
Get PriceAluminum nitride sputtering target AlN sputtering target manufacturer. Able Target Limited is the best Aluminum nitride sputtering target,AlN sputtering Jiangsu +8618963646623 [email protected]
Get Price2021-11-4 · Technical specifications of Aluminum Nitride (AlN) sputtering targets and ordering information is available. Below you may find budgetary pricing for sputtering targets and deposition materials per your requirements. Actual prices may vary due to market fluctuations. Contact [email protected] for current pricing or for a quote on ...
Get Price2018-6-2 · A sputtering power in the range of 300 W to 500 W is typically used in RF sputtering, while a power in the range of 1000 W to 1800 W is typically employed in D.C. sputtering. The sputtering power also depends on the substrate to target distance and the type of sputtering system. For the former, a lower power is needed for a shorter distance.
Get Price2021-11-27 · Aluminum Nitride Sputtering Targets. We offer our Aluminum Nitride Targets in 99.8% purity. You can add requests for our most common circular targets below which range in diameters from 1″ to 8″ round, and from 0.125″ Thick & 0.25″ Thick. If you'd like a quote on a custom Aluminum Nitride Sputtering Target please visit our custom ...
Get PriceAluminum Nitride Sputtering Targets Specifications. Purity: 99.8% or International standards type Shape: Discs, Plate,Step (Dia 3 50mm, Thickness 1mm) Rectangle, Sheet, Step (Length 350mm, Width 200mm, Thickness 1mm)Custom shapes .
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